Product Description

 Vacuum magnetron sputtering machine is widely used in electrical appliances, clocks, lamps, toys, headlights reflectors, cell phone case , instrumentation, plastic, glass, ceramics, tiles and other surface decorative coating and the functionality of the tool and die coating. The so-called "sputtering" is the charge of energetic particles (usually gas positive ions) bombardment of objects, causing the phenomenon of surface atoms escape from the mother. As early as ***2 Grove in the lab discovered this phenomenon. The magnetron sputtering target stationary electromagnetic field, the magnetic field is curved, uniform electric field and the number of electric field for the plane target and coaxial cylindrical target. Electrons under the effective of electric field, accelerated toward the substrate, the process of collision with argon atoms. If the electron has enough energy (about *0ev), then the ionization of Ar + and produce electrons, the electrons onto the substrate, Ar + under the effective of electric field to accelerate toward the cathode (sputtering target) and high-energy bombardment of the target surface. the target occurred sputtering.
Our company magnetron sputtering device has the following major features:
A) film thickness controllability and well repeatability,can be a reliable system of pre-plated thickness of the films and sputtering in a larger surface of uniform film;
2) The adhesion of the film and the substrate is very well. Some of the high energy of sputtered atoms to produce different levels of injection phenomenon, pseudo-diffusion layer formed on the substrate layer of sputtered atoms and substrate atoms fused with each other;
3) Preparation of special material of the film, you can use different materials and sputtering hybrid film, compound film,also can be sputtered into the TiN imitation gold film;
4) layer of high purity sputtering film will not be mixed in the crucible the composition of the heater material